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Study On Beam Characteristics of Flat Panel X-Ray Source Based On Monte Carlo Method

Z Ding1*, (1) The affiliated cancer hospital of zhengzhou university, Zhengzhou, Henan, CN


(Sunday, 7/12/2020)   [Eastern Time (GMT-4)]

Room: AAPM ePoster Library

Purpose: flat panel X-ray source as a promising imaging device, which is still in the development phase. For understanding the clinic performance of the flat-panel X-ray sources at high anode voltage and the optimal physics parameters of anode target, it is necessary to study the flat-panel X-ray sources by some theoretical analysis for providing design guidance to the development of the prototype device. Therefore, we propose a scheme for the beam quality of the flat panel X-ray source based on Monte Carlo(MC)simulation.

Methods: either ZnO nanowire (NW) emitter presents the same X-ray characterization. The total fluence map is accumulated by shifting ZnO NW pattern. In the current device, 400×400 ZnO NW patterns are distributed in the target film. Then the calculated spectrum is compared with the measured spectrum for validating the proposed scheme. Then the spectrums with various silica glass thickness, tungsten target thickness and anode voltage are analyzed for figuring out the optimal physics parameter in the device. And in-air exposure, half-value layer and mean energy are also calculated as three important parameters of beam quality.

Results: comparison between the calculated spectrum and the measured spectrum were basically the same, which validated the proposed scheme. The spectrums with various silica glass thickness, tungsten target thickness and anode voltage were calculated. Found that most of photons are soft X-ray in the beam, and the silica glass base can play an important role in removing the soft X-ray. Further, quantitative analysis of beam quality found the optimal tungsten thickness as 1000nm in the current device at 40 kV.

Conclusion: proposed MC simulation method has been validated. It also shows great potential for analyzing the beam quality of flat-panel X-ray sources and optimizing the thickness of tungsten target film and silica glass.


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